Archive for the ‘Uncategorized’ Category

PRODUCT SPOTLIGHT: HEMA Maleate

Friday, November 11th, 2011
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Item Code: X-846-0000X-846-0000, HEMA Maleate

Product Name: Methacryloyloxyethyl Maleate
CAS#: 51978-15-5

EINECS(I): 257-569-5
INCI: HEMA Maleate

HEMA maleate is a carboxylic acid-containing methacrylate that can function as an alternative to PMDM. It has been used in anaerobic adhesive applications and is approved for use in cosmetic products.

The carboxylic acid group of X-846-0000 has the ability to improve adhesion to keratin.  Its’ monomethacrylate functionality allows it to be incorporated into soak-off systems without detriment to “removability”.  HEMA maleate’s low viscosity also makes it an ideal, reactive diluents.

Contact us directly to discuss your application and request samples, techsupport@esstechinc.com.


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X-970-0000, Photoimprintable Thermoset, used in Nanogratings

Monday, October 25th, 2010
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Exploring Cellular Contact Guidance Using Gradient Nanogratings

Jirun Sun*, Yifu Ding, Nancy J. Lin§, Jing Zhou§, Hyunwook Ro§, Christopher L. Soles§, Marcus T. Cicerone§, and Sheng Lin-Gibson*§

American Dental Association Foundation, Paffenbarger Research Center, Department of Mechanical Engineering, University of Colorado at Boulder,  and Polymers Division, National Institute of Standards and Technology

(Biomacromolecules,DOI: 10.1021/bm100883m, Publication Date (Web): October 18, 2010.  Copyright © 2010 American Chemical Society)

ABSTRACT: Nanoscale surface features that mimic extracellular matrix are critical environmental cues for cell contact guidance and are vital in advanced medical devices in order to manipulate cell behaviors. Among them, nanogratings (line-and-space gratings) are common platforms to study geometric effects on cell contact guidance, especially cell alignment, but generally are one pattern height per platform. In this study, we developed a strategy to fabricate controlled substrates with a wide range of pattern shapes and surface chemistries and to separate surface chemistry and topography effects. As a demonstration of this strategy, six nanograting platforms on three materials were fabricated and applied to examine and differentiate the effects of surface topography and surface chemistry on cell contact guidance of murine preosteoblasts. All of the six platforms contained the same gradient in pattern height (0 to ≈350 nm). They were prepared using nanoimprint lithography and annealing for thermoplastic materials (low molecular weight polystyrene (PS) and polymethylmethacrylate (PMMA)) and photoimprint for a thermoset material (a cross-linked dimethacrylate (DMA)). Each material contains two platforms that are only different in line-and-space pitch (420 or 800 nm). The DMA nanogratings had a reverse line-and-space profile to those of the PS and PMMA nanogratings. Using these platforms, a full range of cell alignment, from randomly orientated to completely parallel to the grating direction was achieved. Results from focal adhesion assays and scanning electronic microscopy indicated a change in cell−substrate contact from a noncomposite state (full contact) to a composite state (partial contact between cell and substrate) as pattern height increased. These gradient platforms allowed for the separation of surface chemistry and surface topography to provide insight into the mechanisms responsible for cell contact guidance on nanopatterned surfaces.

LINK:  http://pubs.acs.org/doi/full/10.1021/bm100883m


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Dental Materials Blog

Tuesday, May 4th, 2010
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It’s our pleasure to present the Dental Materials Blog.

This blog presents topics of interest to dentists, material scientists and PhD students. Feel free to browse around and leave comments.  Recent Posts include:

Dental Materials Blog is coordinated by the Santini Miletic Research Group.  Providing research focused on Recent research has focused on dental resin based composites and adhesives using Raman Spectroscopy, High performance liquid chromatography, Scanning and Transmission Electron Microscopy and Atomic Force Microscopy.  You can contact the Santini Miletic Research Group at: info@santinimiletic.com

Santini Miletic Research

Santini Miletic Research


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Esstech to Present at IADR 2010

Wednesday, April 28th, 2010
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We are very excited to announce the details of our 2010 IADR presentation!

Physical Properties of New Low-Shrink Resin

Friday, July 16, 2010: 3 p.m. – 4:15 p.m.
Location: Exhibit Hall (CCIB)
A. JOHNSTON1, F. RUEGGEBERG2, H.R. RAWLS3, H. SLAFF1, T. BARCLIFT1, and J. DUFF1, 1Esstech Inc, Essington, PA, 2Medical College of Georgia, Augusta, GA, 3University of Texas Health Science Ctr at San Antonio, San Antonio, TX

2010 IADR Meeting Logo


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Esstech to Attend 2010 IADR Show

Friday, March 12th, 2010
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This year, we will be attending the IADR show in Barcelona, Spain.  We are excited to meet all of our international customers and researchers.  Look for us to present a poster on the mechanical properties of our low-shrink, FIT™ 852 Resin.  Let us know if you would like to schedule a meeting with us at the IADR.

 

2010 IADR Meeting Logo


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Esstech Attends 2010 AADR, Washington DC

Friday, March 12th, 2010
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Esstech representatives attended this year’s AADR show in Washington D.C.  It was wonderful seeing our customers face-to-face and learning about the ongoing research in the dental industry.  Many presenters referenced their use of Esstech materials in research – we are gratified by the continued interest from both industry and academia.  Keep up the good work!

 

2010 AADR  


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Welcome!

Wednesday, March 10th, 2010
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WELCOME to Esstech’s New Website

 As industry leaders in the manufacture of photocurables, urethanes and fillers, we have revised our website to provide the user with additional information related to our product category and the many industries we serve.  As we develop our “NEWS” feature, expect to see more technical articles, research papers, current events/news and recommendations from our experienced staff as well as other industry experts.  We look forward to your comments on our posts.  Together we can build a technical community that will drive research & development to new heights.

 Thank you for visiting our site, we look forward to your contributions!

 -Esstech Inc.


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